At the SPIE Optical Systems Design 2024 in Strasbourg, Valeriia Sedova was awarded third place for the Best Paper during the SPIE Conference on Computational Optics on April 10 - 11. At this Conference, Valeriia Sedova presented the paper "Advances in modeling and optimization for two-photon lithography". The decisive evaluation criteria for the papers were clarity of presentation, scientific merit, and potential innovative impact. The Best Paper Awards included a cash reward and an award certificate. With a focus on computation and modeling of various optical lithography techniques, including EUV, grayscale, and two-photon lithography, Valeriia has been serving as a researcher in the Lithography and Optics Simulation Department of the Modeling and Artificial Intelligence Division at Fraunhofer Institute for Integrated Systems and Device Technology IISB for the past four years.
more info