56. Treffen der Nutzergruppe Ionenimplantation

Begrüßung
Volker Häublein, Fraunhofer (IISB), Erlangen

Zusammenfassung IIT 2016
Lutz Ende, X-FAB Erfurt & Jan Krügener, Universität Hannover

Ion Implantation for Photovoltaic Applications: Review and Outlook for Silicon Solar Cells
Jan Krügener, Universität Hannover

Beam Purity and Contamination Issues for Implants into Si and III-V Devices
Michael Current, Silicon Genesis Corporation, San Jose / USA

E-Chuck Problem an der VIISTA900
Alexander Scheit, IHP, Frankfurt (Oder)

Wafer Stress Management for Millisecond Annealing
Markus Hagedorn, Mattson Thermal Products GmbH, Dornstadt

Flash Lamp Annealing of Transparent Conducting Oxides and other Thin Films
Lars Rebohle, Helmholtz-Zentrum Dresden-Rossendorf

Microwave Annealing for Dopant Activation, Damage Recovery and Strain Stabilization
Michael Current, Silicon Genesis Corporation, San Jose / USA

IIT 2018 in Würzburg
Heiner Ryssel, Fraunhofer IISB, Erlangen