Workshop "Adaptation of novel process technologies on legacy equipment"

Optimization of in situ chamber cleans on AMAT PETEOS and PESilane P5000 tools
Kai-Alexander Schreiber, Infineon Technologies AG, Villach, Austria

Wafer carriers for CVD equipment
Helmut Schönherr, Infineon Technologies AG, Villach, Austria

Using a 0.35 um - 0.25 um gate etcher for critical 0.18 um processes. Problems and process stabilization
Gehard Spitzlsperger, Renesas Semiconductor Europe GmbH, Landshut, Germany

Product enhancements for legacy systems
Thomas Wimmer, Applied Materials GmbH, Dresden, Germany

Extendibility of Sigma fxP for contact and via line application
Norbert Urbansky (1), Paul Rich (2), (1) Infineon Technologies AG, Dresden, Germany, (2)Trikon Technologies Ltd., Newport, United Kingdom