Fraunhofer Institute for Integrated Systems and Device Technology IISB| Jahr Year | Titel/Autor:in Title/Author | Publikationstyp Publication Type |
|---|---|---|
| 2025 | Physics-informed deep learning for 3D modeling of light diffraction from optical metasurfaces Medvedev, Vladimir; Erdmann, Andreas; Roßkopf, Andreas |
Zeitschriftenaufsatz Journal Article |
| 2024 | 3D EUV Mask Simulator based on Physics-Informed Neural Networks: effects of polarization and illumination Medvedev, Vladimir M.; Erdmann, Andreas; Roßkopf, Andreas |
Konferenzbeitrag Conference Paper |
| 2023 | 3D Mask Simulation and Lithographic Imaging using Physics-Informed Neural Networks Medvedev, Vlad; Erdmann, Andreas; Roßkopf, Andreas |
Meeting Abstract |
| 2022 | 3D mask defect and repair simulation based on SEM images Medvedev, Vladimir; Evanschitzky, Peter; Erdmann, Andreas |
Konferenzbeitrag Conference Paper |
| 2022 | Precise optical constants: determination and impact on metrology, simulation and development of EUV masks Saadeh, Qais; Mesilhy, Hazem; Soltwisch, Victor; Erdmann, Andreas; Ciesielski, Richard; Lohr, Leonhard M.; Andrle, Anna; Philipsen, Vicky; Thakare, Devesh; Laubis, Christian; Scholze, Frank; Kolbe, Michael |
Konferenzbeitrag Conference Paper |
| 2022 | Attenuated phase shift masks: A wild card resolution enhancement for extreme ultraviolet lithography? Erdmann, Andreas; Mesilhy, Hazem; Evanschitzky, Peter |
Zeitschriftenaufsatz Journal Article |
| 2021 | Modeling the impact of shrinkage effects on photoresist development D'Silva, S.; Mülders, T.; Stock, H.-J.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2021 | Investigation of waveguide modes in EUV mask absorbers Mesilhy, H.; Evanschitzky, P.; Bottiglieri, G.; Lare, C. Van; Setten, E. Van; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2021 | Simulation of polychromatic effects in high NA EUV lithography Erdmann, A.; Mesilhy, H.; Evanschitzky, P.; Saadeh, Q.; Soltwisch, V.; Bihr, S.; Zimmermann, J.; Philipsen, V. |
Konferenzbeitrag Conference Paper |
| 2021 | Stochastic simulation and calibration of organometallic photoresists for extreme ultraviolet lithography Belete, Z.; Bisschop, P. de; Welling, U.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2021 | Simulation study on EUV multilayer polarization effects Bilalaj, L.; Mesilhy, H.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2021 | Study of novel EUVL mask absorber candidates Wu, M.; Thakare, D.; Marneffe, J.-F. de; Jaenen, P.; Souriau, L.; Opsomer, K.; Soulié, J.-P.; Erdmann, A.; Mesilhy, H.; Naujok, P.; Foltin, M.; Soltwisch, V.; Saadeh, Q.; Philipsen, V. |
Zeitschriftenaufsatz Journal Article |
| 2021 | Accurate prediction of EUV lithographic images and 3D mask effects using generative networks Awad, A.; Brendel, P.; Evanschitzky, P.; Woldeamanual, D.S.; Rosskopf, A.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2021 | Mask defect detection with hybrid deep learning network Evanschitzky, P.; Auth, N.; Heil, T.; Hermanns, C.F.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2020 | Mask absorber for next generation EUV lithography Wu, M.; Thakare, D.; Marneffe, J.-F. de; Jaenen, P.; Souriau, L.; Opsomer, K.; Soulié, J.-P.; Erdmann, A.; Mesilhy, H.; Naujok, P.; Foltin, M.; Soltwisch, V.; Saadeh, Q.; Philipsen, V. |
Konferenzbeitrag Conference Paper |
| 2020 | Pathfinding the perfect EUV mask: The role of the multilayer Mesilhy, H.; Evanschitzky, P.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2020 | Perspectives and tradeoffs of absorber materials for high NA EUV lithography Erdmann, A.; Mesilhy, H.; Evanschitzky, P.; Philipsen, V.; Timmermans, F.; Bauer, M. |
Zeitschriftenaufsatz Journal Article |
| 2019 | Lithographic effects due to particles on high-NA EUV mask pellicle Devaraj, L.; Bottiglieri, G.; Erdmann, A.; Wählisch, F.; Kupers, M.; Setten, E. van; Fliervoet, T. |
Konferenzbeitrag Conference Paper |
| 2019 | Mask absorber development to enable next-generation EUVL Philipsen, V.; Luong, K.V.; Opsomer, K.; Souriau, L.; Rip, J.; Detavernier, C.; Erdmann, A.; Evanschitzky, P.; Laubis, C.; Honicke, P.; Soltwisch, V.; Hendrickx, E. |
Konferenzbeitrag Conference Paper |
| 2019 | Attenuated phase shift mask for extreme ultraviolet: Can they mitigate three-dimensional mask effects? Erdmann, A.; Evanschitzky, P.; Mesilhy, H.; Philipsen, V.; Hendrickx, E.; Bauer, M. |
Zeitschriftenaufsatz Journal Article |
| 2019 | Learned sensing: Jointly optimized microscope hardware for accurate image classification Muthumbi, A.; Chaware, A.; Kim, K.; Zhou, K.C.; Konda, P.C.; Chen, R.; Judkewitz, B.; Erdmann, A.; Kappes, B.; Horstmeyer, R. |
Zeitschriftenaufsatz Journal Article |
| 2019 | 3D mask effects in high NA EUV imaging Erdmann, A.; Evanschitzky, P.; Bottiglieri, G.; Setten, E. van; Fliervoet, T. |
Konferenzbeitrag Conference Paper |
| 2018 | Fourier ptychography for lithography high NA systems Dejkameh, A.; Erdmann, A.; Evanschitzky, P.; Ekinci, Y. |
Konferenzbeitrag Conference Paper |
| 2018 | Simulation study of illumination effects in high-NA EUV lithography Ismail, M.; Evanschitzky, P.; Erdmann, A.; Bottiglieri, G.; Setten, E. van; Fliervoet, T.F. |
Konferenzbeitrag Conference Paper |
| 2018 | Modeling of block copolymer dry etching for directed self-assembly lithography Belete, Zelalem; Bär, Eberhard; Erdmann, Andreas |
Konferenzbeitrag Conference Paper |
| 2018 | Application of deep learning algorithms for Lithographic mask characterization Woldeamanual, D.S.; Erdmann, A.; Maier, A. |
Konferenzbeitrag Conference Paper |
| 2018 | Accurate determination of 3D PSF and resist effects in grayscale laser lithography Onanuga, T.; Kaspar, C.; Sailer, H.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2018 | Attenuated PSM for EUV Erdmann, A.; Evanschitzky, P.; Mesilhy, H.; Philipsen, V.; Hendrickx, E.; Bauer, M. |
Konferenzbeitrag Conference Paper |
| 2018 | Novel EUV mask absorber evaluation in support of next-generation EUV imaging Philipsen, V.; Luong, K.V.; Opsomer, K.; Detavernier, C.; Hendrickx, E.; Erdmann, A.; Evanschitzky, P.; Kruijs, R.W.E. van de; Heidarnia-Fathabad, Z.; Scholze, F.; Laubis, C. |
Konferenzbeitrag Conference Paper |
| 2017 | Simulation flow and model verification for laser direct-write lithography Onanuga, T.; Rumler, M.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2017 | Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model Wu, X.; Fühner, T.; Erdmann, A.; Lam, E.Y. |
Konferenzbeitrag Conference Paper |
| 2017 | Special issue on ptychography Erdmann, A.; Situ, G. |
Zeitschriftenaufsatz Journal Article |
| 2017 | A physical model for innovative laser direct write lithography Onanuga, T.; Rumler, M.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2017 | Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography Erdmann, A.; Xu, D.; Evanschitzky, P.; Philipsen, V.; Luong, V.; Hendrickx, E. |
Zeitschriftenaufsatz Journal Article |
| 2017 | Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers Philipsen, V.; Luong, K.V.; Souriau, L.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C.; Hendrickx, E. |
Zeitschriftenaufsatz Journal Article |
| 2017 | Efficient simulation of EUV pellicles Evanschitzky, P.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2017 | Reducing EUV mask 3D effects by alternative metal absorbers Philipsen, V.; Luong, K.V.; Souriau, L.; Hendrickx, E.; Erdmann, A.; Xu, D.; Evanschitzky, P.; Kruijs, R.W.E. van de; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M.; Naasz, S.; Reuter, C. |
Konferenzbeitrag Conference Paper |
| 2016 | Extreme ultraviolet multilayer defect analysis and geometry reconstruction Xu, D.; Evanschitzky, P.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2016 | Resolution enhancements for semiconductor lithography: A computational perspective Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2016 | Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach Fühner, T.; Michalak, P.; Wu, X.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2016 | Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography Erdmann, A.; Evanschitzky, P.; Neumann, J.T.; Gräupner, P. |
Zeitschriftenaufsatz Journal Article |
| 2016 | 3D simulation of light exposure and resist effects in laser direct write lithography Onanuga, Temitope; Erdmann, Andreas |
Konferenzbeitrag Conference Paper |
| 2016 | Challenges for predictive EUV mask modeling Evanschitzky, Peter; Erdmann, Andreas |
Vortrag Presentation |
| 2016 | Incorporating photomask shape uncertainty in computational lithography Wu, X.; Liu, S.; Erdmann, A.; Lam, E.Y. |
Konferenzbeitrag Conference Paper |
| 2016 | Efficient simulation of EUV pellicles Evanschitzky, Peter; Erdmann, Andreas |
Vortrag Presentation |
| 2016 | Extending VLSI and alternative technology with optical and complementary lithography Lai, K.; Erdmann, A. |
Editorial |
| 2015 | Optical and EUV projection lithography: A computational view Erdmann, A.; Fühner, T.; Evanschitzky, P.; Agudelo, V.; Freund, C.; Michalak, P.; Xu, D.B. |
Zeitschriftenaufsatz Journal Article |
| 2015 | Application of principal component analysis to EUV multilayer defect printing Xu, D.; Evanschitzky, P.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2015 | Mask-induced best-focus-shifts in DUV and EUV lithography Erdmann, A.; Evanschitzky, P.; Neumann, J.T.; Gräupner, P. |
Konferenzbeitrag Conference Paper |
| 2015 | Application of the transport of intensity equation to EUV multilayer defect analysis Xu, D.; Evanschitzky, P.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2015 | Continuation of scaling with optical and complementary lithography. Editorial Lai, K.F.; Erdmann, A. |
Editorial |
| 2015 | Introduction to the special issue on optical lithography Erdmann, A.; Shibuya, M. |
Zeitschriftenaufsatz Journal Article |
| 2014 | Aberration measurement technique based on an analytical linear model of a through-focus aerial image Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2014 | Challenges and opportunities for process modeling in the nanotechnology era Lorenz, J.K.; Baer, E.; Burenkov, A.; Erdmann, A.; Evanschitzky, P.; Pichler, P. |
Zeitschriftenaufsatz Journal Article |
| 2014 | Advances in lithography: Introduction to the feature. Editorial Erdmann, A.; Liang, R.G.; Sezginer, A.; Smith, B. |
Editorial |
| 2014 | Advances in lithography: Introduction to the feature. Editorial Erdmann, A.; Liang, R.G.; Sezginer, A.; Smith, B. |
Editorial |
| 2014 | Application of artificial neural networks to compact mask models in optical lithography simulation Agudelo, V.; Fühner, T.; Erdmann, A.; Evanschitzky, P. |
Zeitschriftenaufsatz Journal Article |
| 2014 | Pixel-based defect detection from high-NA optical projection images Xu, D.B.; Fühner, T.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2014 | Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography Liu, Xiaolei; Wang, Xiangzhao; Li, Sikun; Yan, Guanyong; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2014 | Rigorous simulation and optimization of the lithography/directed self-assembly co-process Fühner, T.; Welling, U.; Müller, M.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2014 | In situ aberration measurement method using a phase-shift ring mask Wang, X.; Li, S.; Yang, J.; Tang, F.; Yan, G.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2014 | Lithographic process window optimization for mask aligner proximity lithography Voelkel, R.; Vogler, U.; Bramati, A.; Erdmann, A.; Ünal, N.; Hofmann, U.; Hennemeyer, M.; Zoberbier, R.; Nguyen, D.; Brugger, J. |
Konferenzbeitrag Conference Paper |
| 2014 | Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography Liu, X.; Wang, X.; Li, S.; Yan, G.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2014 | A defocus measurement method for an in situ aberration measurement method using a phase-shift ring mask Li, S.; Wang, X.; Yang, J.; Tang, F.; Yan, G.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2013 | Efficient simulation of extreme ultraviolet multilayer defects with rigorous data base approach Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas |
Zeitschriftenaufsatz Journal Article |
| 2013 | Defect inspection and detection using optical image projection Xu, D.; Li, S.; Wang, X.; Erdmann, A. |
Vortrag Presentation |
| 2013 | Modeling studies on alternative EUV mask concepts for higher NA Erdmann, A.; Fühner, T.; Evanschitzky, P.; Neumann, J.T.; Ruoff, J.; Gräupner, P. |
Konferenzbeitrag Conference Paper |
| 2013 | In situ aberration measurement technique based on an aerial image with an optimized source Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2013 | Defect parameters retrieval based on optical projection images Xu, D.; Li, S.; Wang, X.; Fühner, T.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2013 | Modeling strategies for EUV mask multilayer defect dispositioning and repair Erdmann, A.; Evanschitzky, P.; Bret, T.; Jonckheere, R. |
Konferenzbeitrag Conference Paper |
| 2013 | Source mask optimization using real-coded genetic algorithms Yang, C.; Wang, X.; Li, S.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2013 | Adaptive denoising method to improve aberration measurement performance Yang, J.; Wang, X.; Li, S.; Duan, L.; Bourov, A.Y.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2013 | Application of artificial neural networks to compact mask models in optical lithography simulation Agudelo, V.; Fühner, T.; Erdmann, A.; Evanschitzky, P. |
Konferenzbeitrag Conference Paper |
| 2013 | High-order aberration measurement technique based on quadratic Zernike model with optimized source Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2012 | Simulation of 3D inclined/rotated UV lithography and its application to microneedles Liu, S.; Roeder, G.; Aygun, G.; Motzek, K.; Evanschitzky, P.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2012 | Advanced mask aligner lithography (AMALITH) Völkel, R.; Vogler, U.; Bramati, A.; Weichelt, T.; Stürzebecher, L.; Zeitner, U.D.; Motzek, K.; Erdmann, A.; Hornung, M.; Zoberbier, R. |
Konferenzbeitrag Conference Paper |
| 2012 | Resist properties required for 6.67 nm extreme ultraviolet lithography Kozawa, T.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2012 | In-situ aberration measurement technique based on aerial image with optimized source Yan, G.; Wang, X.; Li, S.; Yang, J.; Xu, D.; Duan, L.; Bourov, A.Y.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2012 | Efficient simulation of EUV multilayer defects with rigorous data base approach Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas |
Konferenzbeitrag Conference Paper |
| 2012 | Influence of two typical defects on the near-field optical properties of multilayer dielectric compression gratings Jin, Y.X.; Guan, H.Y.; Kong, F.Y.; Wang, J.P.; Erdmann, A.; Liu, S.J.; Du, Y.; Shao, J.D.; He, H.B.; Yi, K. |
Zeitschriftenaufsatz Journal Article |
| 2012 | Analysis of EUV mask multilayer defect printing characteristics Erdmann, A.; Evanschitzky, P.; Bret, T.; Jonckheerec, R. |
Konferenzbeitrag Conference Paper |
| 2012 | In situ aberration measurement technique based on quadratic Zernike model Yang, J.; Wang, X.; Li, S.; Duan, L.; Yan, G.; Xu, D.; Bourov, A.Y.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2012 | Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography Agudelo, V.; Evanschitzky, P.; Erdmann, A.; Fühner, T. |
Konferenzbeitrag Conference Paper |
| 2012 | Mutual source, mask and projector pupil optimization Fühner, T.; Evanschitzky, P.; Erdmann, A. |
Konferenzbeitrag Conference Paper |
| 2012 | Mask aligner lithography simulation - From lithography simulation to process validation Motzek, K.; Partel, S.; Bramati, A.; Hofmann, U.; Unal, N.; Hennemeyer, M.; Hornung, M.; Heindl, A.; Ruhland, M.; Erdmann, A.; Hudek, P. |
Zeitschriftenaufsatz Journal Article |
| 2012 | Rigorous electromagnetic field simulation of the impact of photomask line-edge and line-width roughness on lithographic processes Rudolph, O.; Evanschitzky, P.; Erdmann, A.; Bär, E.; Lorenz, J. |
Zeitschriftenaufsatz Journal Article |
| 2012 | Imaging characteristics of binary and phase shift masks for EUV projection lithography Erdmann, A.; Evanschitzky, P. |
Konferenzbeitrag Conference Paper |
| 2012 | Resonant metamaterials for contrast enhancement in optical lithography Dobmann, S.; Shyroki, D.; Banzer, P.; Erdmann, A.; Peschel, U. |
Zeitschriftenaufsatz Journal Article |
| 2011 | Influence of geometry variations and defects on the near-field optical properties of pulsed compression gratings Wang, J.; Erdmann, A.; Liu, S.; Shao, J.; Jin, Y.; He, H.; Yi, K. |
Konferenzbeitrag Conference Paper |
| 2011 | Compensation of mask induced aberrations by projector wavefront control Evanschitzky, Peter; Shao, Feng; Fühner, Tim; Erdmann, Andreas |
Konferenzbeitrag Conference Paper |
| 2011 | Innovations in structured thin film design and fabrication for optical applications Qi, H.; Wang, J.; Erdmann, A.; Jin, Y.; Shao, J.; Fan, Z. |
Konferenzbeitrag Conference Paper |
| 2011 | Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography Erdmann, A.; Shao, F.; Agudelo, V.; Fühner, T.; Evanschitzky, P. |
Zeitschriftenaufsatz Journal Article |
| 2011 | Computational algorithms for optimizing mask layouts in proximity printing Motzek, K.; Vogler, U.; Hennemeyer, M.; Hornung, M.; Voelkel, R.; Erdmann, A.; Meliorisz, B. |
Zeitschriftenaufsatz Journal Article |
| 2011 | Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes Rudolph, O.H.; Evanschitzky, P.; Erdmann, A.; Bär, E.; Lorenz, J. |
Konferenzbeitrag Conference Paper |
| 2011 | Feasibility study of chemically amplified resists for short wavelength extreme ultraviolet lithography Kozawa, T.; Erdmann, A. |
Zeitschriftenaufsatz Journal Article |
| 2011 | Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes Rudolph, Oliver; Evanschitzky, Peter; Erdmann, Andreas; Bär, Eberhard; Lorenz, Jürgen |
Poster |
| 2011 | Predictive modeling of EUV-lithography: The role of mask, optics, and photoresist effects Erdmann, A.; Evanschitzky, P.; Shao, F.; Fühner, T.; Lorusso, G.; Hendrickx, E.; Goethals, A.M.; Jonckheere, R.; Bret, T.; Hofmann, T. |
Konferenzbeitrag Conference Paper |
| 2011 | Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing Motzek, Kristian; Partel, Stefan; Vogler, Uwe; Erdmann, Andreas |
Konferenzbeitrag Conference Paper |
| 2011 | Determination of the dill parameters of thick positive resist for use in modeling applications Roeder, G.; Liu, S.; Aygun, G.; Evanschitzky, P.; Erdmann, A.; Schellenberger, M.; Pfitzner, L. |
Konferenzbeitrag Conference Paper |
| 2011 | Analytical model for EUV mask diffraction field calculation Cao, Y.; Wang, X.; Erdmann, A.; Bu, P.; Bu, Y. |
Konferenzbeitrag Conference Paper |
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