SPIE Advanced Lithography + Patterning 2025

The Event for Emerging Technology in the Semiconductor Industry

Join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

The conference includes:

• Plenary talks
• Technical presentations
• Networking sessions
• Course offerings
• Exhibition
   

The following presentations report on research results from Fraunhofer IISB:

Exploring the Crucial Role of Mask3D-induced Imaging Mechanisms in High- and Hyper-NA EUV Lithography: A Study of the Near- and Far-field of the Diffracted Light (invited paper)
by A. Erdmann et al. | 26 February 2025, 8:00 AM - 8:20 AM PST (oral presentation) | Convention Center, Grand Ballroom 220A

Physics-based Deep Learning Network for Two-photon Polymerization Lithography
by V. Sedova et al. | 26 February 2025, 5:30 PM - 7:00 PM PST (poster session) | Convention Center, Hall 2
 

We are looking forward to seeing you in San Jose!

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