Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB
Fraunhofer IISB Lithography Simulation Workshop 2025
Veranstaltungsdetails
Veranstaltungsort
Gößweinstein
Datum
22. Mai 2025 - 24. Mai 2025
Diffraction cone of mask aligner simulated with Dr.LiTHO
Near field inside opening between EUV mask absorbers simulated with Dr.LiTHO
Andreas Erdmann (4th from the left) and the Fraunhofer IISB Computational Lithography and Optics Team at the IISB Lithography Simulation Workshop 2024
Our 20th Fraunhofer IISB lithography simulation workshop will bring together experts from various fields of lithography simulation and related areas including computational optics, photochemistry, semiconductor processing /metrology and applied artificial intelligence.
The workshop will host about 50 attendees from academics and industry. The invited talks will present reviews on recent developments and applications of computational lithography, description of novel methods to address lithography-related problems and discuss selected unresolved problems.
In addition to presentations by international experts in semiconductor lithography, the workshop provides excellent opportunities for invited PhD students to present their research work and to exchange ideas and discuss results and developments in advanced lithography. An archive with the program flyers of previous workshops can be found here.
The workshop will take place in Gößweinstein from May 22 to 24, 2025.. The location in the heart of Franconian Switzerland about 50 km north of Nuremberg is ideal for networking.
The workshop will focus on the following topics:
- High and hyper NA EUV lithography: 3D mask effects and mitigation strategies, novel photoresist materials and processes to achieve a better resolution, sensitivity and line edge roughness
- Deep learning / AI in lithography: physics informed neural networks for computational lithography, deep learning for inverse imaging problems, optimization and process control
- 3D lithography and light-based additive manufacturing: maskless single-photon, two-photon and multi-color lithography, grayscale lithography, manufacturing aware design of optical metasurfaces
- Metrology for computational litho: characterization of photoresists, masks, patterned wafers and other components
The registration for the workshop will open in March 2025. Updates will be provided via our mailing list. If you would like to subscribe to the list, please send an e-mail to Andreas Erdmann.